HIGH PERFORMANCE PROCESS MONITORING SYSTEM

Many process monitoring systems fail to deliver user requirements because they present

data in a format that is not easily understood by the operator. The value of the trace gas

analysis is often lost, and the RGA may never deliver the payback intended.

The Vision 2000-P™ represents a different concept in process monitoring, requiring

minimum operator interaction or RGA knowledge. The Vision 2000-P incorporates the “smart

head” RGA technology of the Microvision 2 with a closed ion source and close-coupled inlet.

Platform, a recipe based, user-configurable software program. The advanced technology

available in the Vision 2000-P provides users with simple, effective, process monitoring

operation including:

•ppbleveldetectionofcontaminantgasesduringPVDprocesses

— Sensitivity to detect even small amounts of contamination sometimes introduced

during preventative maintenance cycles

•FasterPMrecoverythroughvacuumanalysis

— Constant baseline vacuum troubleshooting

•Singlepushbuttonoperationtostartrecipes

Features & Benefits

Baseline monitoring of PVD chambers for air

leaks and background contamination levels

• Abilitytotrackprocessgasmixture

composition where two gases are utilized

(i.e. Ar and n

• VacuumtroubleshootingforfastPM

recovery

• Canbeintegratedwithawidevarietyof

PVD tools

• RemoteVacuumController(RVC)forfail-

safe PC-based operation and control

• AvailablewithProcessEyeProfessional

software for

— Automated, recipe based operation

— User configurable, intelligent alarms

— High level tool integration

— Advanced data presentation (i.e.

simultaneous bar chart/trend screen

displays)

• Simultaneousmultiple-sensoroperation

capability

Applications

The Vision 2000-P is an application-specific

process monitoring system designed

to monitor contamination levels within

semiconductor and thin film PVD process

tools and to alert of conditions that can

negatively impact product yield. In addition,

the Vision 2000-P optimizes vacuum quality

with

• Contaminationmonitoring,including

hydrocarbons, to sub-ppm levels during

PVD process

• Residualgasmonitoring,includingair

and water